Can Silane and Nitrogen Trifluoride be Processed Simultaneously in a Treatment System?
Ram S. Ramachandran - MG Industries; Kevin D. McGrath - MG Industries (SSA Journal - March 1993 pp. 57 - 59)
In semiconductor processing, process gas exhaust from multiple tools or multiple chambers of a single tool may contain incompatible gases and hence handling them in a single treatment system poses a challenging problem. In this paper, results of tests conducted to examine the effects of simultaneously introducing silane (a strong reducer) and nitrogen trifluoride (a strong oxidizer) into a Guardian, a commercially available thermal processor, are presented.
In the ranges of gas flows tested (silane 0.65-2.5 1pm, NF3 2-8 1pm, and nitrogen 0-185 1pm), silane was introduced into a steady flow of NF3 and then NF3 was introduced into a steady flow of silane. During tests, all monitored process variables were maintained within the specified operating range and the silane concentration in the Guardian exhausts was less than 5 ppm.
Hence, the answer to the question, "Can silane and nitrogen trifluoride be processed simultaneously in a treatment system?" is a definite yes if the chosen treatment system utilizes an active controlled turbulent combustion process, as present in the Guardian Gas Protection System.