SESHA 2003 Symposium - Abstract

Environmental, Health and Safety Assessment of Emerging Photolithography Technology

Heaps, Jeff*; Beu, Laurie ; Pawsat, Sally
(International SEAMTECH, Austin TX, Motorola SPS, Austin TX, )

Significant technology challenges face the next few generations of photolithography in the Semiconductor Industry. Investigating the solutions to these challenges brings the rapid introduction of new materials and processes. Environmental, health and safety (EHS) assessment during the research and development (R&D) of these new materials and processes is essential to ensure worker and environmental protection, avoid excessive EHS controls and prevent delays in process transfer to manufacturing. This presentation gives an overview of the EHS impacts associated with the emerging materials and processes of advanced photolithography, provides an update of the PFAS issue and its potential impact on advanced photolithography, and discusses approaches to performing a comprehensive EHS assessment during the R&D phase.

[abstract as .pdf]