SESHA 2006 Symposium - Abstract

Exhaust Management System for EH&S Compliance in Semiconductor R&D Environment

Huynh, Tom; Le, Trang; Schiller, Dina
(Applied Materials, Santa Clara, CA)

The continued use of various hazardous substances for process research and development in wafer fabrication present challenges to the semiconductor facilities in evaluating the effectiveness of the best available abatement technologies and in ensuring environmental, health and safety (EH&S) compliance without compromising the flexibility of conducting research and development (R&D) activities and facilities operation. This paper discusses the exhaust management system developed by Applied Materials EH&S for process exhaust abatement. The Applied exhaust management system involves the development of effluent assessment database, air modeling, and extensive stakeholder reviews.

[abstract as .pdf]