SESHA 2007 Symposium - Abstract

Plasma Etch Equipment Safety Considerations

Claes, Brian
(Lam Research, Fremont, CA)

Although technologies and processes may vary significantly, plasma etch equipment generally presents a variety of potential hazard risks (chemical, electromagnetic, mechanical, etc.) in normal operation and maintenance. This presentation will address these risks and common industry approaches used to managing these risks through engineering design, administrative controls and application of published guidelines and standards.

[abstract as .pdf]